Future Tech

ASML reaches 'first light' milestone on first High NA EUV tool

Tan KW
Publish date: Wed, 28 Feb 2024, 11:28 PM
Tan KW
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AMSTERDAM - ASML has reached "first light" on its massive new High NA EUV lithography system, the Dutch semiconductor equipment maker confirmed on Wednesday, a milestone that means the tool is functioning though not at full performance.

The head of technology development at Intel, Ann Kelleher, first mentioned the progress during a talk at the SPIE lithography conference on Tuesday in San Jose.

ASML confirmed Kelleher's remarks were accurate.

 


  - Reuters

 

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